Photomask Yield Engineer

Tekscend Photomask Round Rock, Inc

Round Rock, TX

JOB DETAILS
SKILLS
8D, Academic Background, Analysis Skills, Chemical Engineering, Continuous Improvement, Corrective Action, Data Analysis, Data Quality, Debugging Skills, Electrical Engineering, Failure Analysis, Leadership, Lean Six Sigma, Manufacturing, Manufacturing/Industrial Processes, Material Science, Mechanical Engineering, Metrology, Microsoft Excel, Minitab, Oracle SQLPlus, Physics, Power BI, Problem Solving Skills, Process Improvement, Product/Service Launch, Productivity Management, Python Programming/Scripting Language, Quality Assurance, R Programming Language, Reporting Dashboards, Root Cause Analysis, SQL (Structured Query Language), Search Engine Marketing (SEM), Semiconductors, Six Sigma Black Belt, Six Sigma Certification, Six Sigma DMAIC, Six Sigma Green Belt, Structured Analysis, Tableau, Test Patterns, Traceability, Trend Analysis, United States Department of Energy (DOE), Variance Analysis
LOCATION
Round Rock, TX
POSTED
30+ days ago

We are seeking a data‑driven Photomask Yield Engineer to own end‑to‑end yield analytics and drive continuous improvement across all photomask manufacturing processes. You will generate and maintain yield pareto reports, identify systemic yield detractors, lead root‑cause investigations, and partner with cross‑functional teams to deliver measurable improvements in yield, cost, quality, and cycle time.

 

Yield Analytics & Reporting

  • Build and maintain daily/weekly/monthly yield paretos across all photomask process steps (write, develop, etch, clean, inspection/repair, pellicle attach).
  • Analyze top yield detractors, emerging trends, excursion patterns, and process/tool correlations.
  • Create dashboards and automated reports (e.g., Python + SQL + Power BI/Tableau/JMP) to communicate yield performance and progress to leadership and shop‑floor teams.

Continuous Improvement & Problem Solving

  • Lead structured root cause analysis (8D, DMAIC, Ishikawa/Fishbone, 5 Whys), implement containment, corrective, and preventive actions.
  • Use SPC, DOE, and regression/ANOVA to validate changes and quantify impact.
  • Drive cross‑functional yield projects with Process, Metrology, Inspection, Equipment, and QA to reduce defectivity, variation, rework, and scrap.
  • Partner on NPI/technology transfers to ensure robust yield ramp and stable production windows.

Process & Tool Ownership (Yield Focus)

  • Monitor and improve yield for critical modules: e‑beam/laser write, develop, etch, cleans, inspection/repair (e.g., KLA, Lasertec/AIMS), registration, CD, pellicle attach.
  • Collaborate on tool health, PM optimization, and recipe/process window tuning to minimize excursions and drift.
  • Strengthen data integrity: traceability, lot histories, defect classification, test structures, and failure coding consistency.

Basic Qualifications

  • Bachelor's degree in Electrical Engineering, Materials Science, Chemical Engineering, Mechanical Engineering, Physics, or related field.
  • 3+ years relevant experience in photomask, semiconductor, or advanced manufacturing (strong academic/coop background considered for entry‑level).
  • Proficiency with data/analytics tools: Python or R, SQL, JMP/Minitab; strong Excel.
  • Hands‑on experience with SPC, DOE, and root‑cause/problem‑solving methodologies.
  • Ability to interpret metrology/inspection data (CD, registration, defect maps, tool monitors).

Preferred Qualifications

  • Direct experience in photomask manufacturing (write, develop, etch, clean, pellicle, inspection/repair) and defect classification systems.
  • Familiarity with AIMSactinic, KLA/Lasertec, CD‑SEM, registration tools, and yield‑relevant test patterns/OPC.
  • Knowledge of phase‑shift masks, MoSi/Cr stacks, pellicles, and mask shop data flows.
  • Experience automating yield reporting with Python + SQL and visualization (Excel, Power BI/Tableau).
  • Lean/Six Sigma certification (Green/Black Belt) or equivalent hands‑on experience in CI projects.
  • Demonstrated success driving cross‑functional yield improvements in high‑mix or high‑volume environments.
  • Familiarity with Photomask Failure Analysis methods to identify defect root cause.

 

About the Company

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Tekscend Photomask Round Rock, Inc