Investigate interactions between slurry chemistries and dielectric/metal films, as well as surface interactions with functional components, understand CMP mechanisms, enhance slurry performance (e.g., removal rate, topography, defectivity), and minimize corrosion, metal contamination, and particle/byproduct re-adsorption. We have six U.S. manufacturing and Research & Development facilities, located in: Mesa, Arizona; Castroville, California; Hollister, California; Carrollton, Texas; and North Kingstown, Rhode Island—each offering unique local experiences, from vibrant cultural scenes to historic charm.