Practical knowledge of low-temperature plasma processing of materials, including plasma-assisted etching, ion/surface interactions, fluorination, oxygen and hydrogen surface chemistry, plasma activated desorption, and highly selective or self-limiting processes relevant to nanofabrication of microelectronics and quantum-device materials. Strong ability to connect atomistic simulation results to experimentally relevant materials properties and processing outcomes, including defect formation, surface functionalization, selective etching, plasma-induced damage, optoelectronic properties, surface cleaning, and modification of 2D materials.