The ideal candidate will have several years of process development experience in etching (chemical etch, plasma etch, ion beam etch), deposition (electron beam evaporation, sputtering), lithography (photolithography, electron beam lithography) and metrology (SEM, AFM, TEM, stylus profilometry, white light interferometry). In this role, the candidate will work collaboratively with a cross functional team of process engineers, PIC designers, RF designers, and PIC characterization engineers to fabricate non-linear photonic integrated circuits based on thin film lithium niobate.