Assist engineers with developing and qualifying ALD, CVD, and PECVD processes for thin film dielectrics: gate dielectrics, high-k materials, spacer films and annealing for Core Tr/Cap dielectrics shallow trench isolation, dielectric barrier, inter-layer dielectrics (ILD), dielectric barrier, inter-metallic dielectrics (IMD) and passivation for Isolation and passivation anti-reflective dielectric, blanket hardmask, ALD hardmask, high selective metal-containing hardmask, dry PR for Patterning enabling films. You ll optimize mechanical, chemical, optical, and electrical properties of dielectric thin films including but not limited to film stress, conformality, gapfill, dielectric constant, and leakage current while balancing thermal budgets and integration constraints across radically different product requirements.