The successful candidate will develop and optimize ALD processes for the deposition of thick multilayer structures on both flat and patterned substrates, and will characterize film thickness, crystallinity, strain, and optical properties using a broad range of analytical techniques, including X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy. This position, within the XSD/Optics Group, offers a unique opportunity to work at the forefront of X-ray optics development in a highly collaborative environment, partnering with researchers across multiple Argonne divisions, including the Center for Nanoscale Materials (CNM), the Materials Science Division (MSD), and the Applied Materials Division.