Deep understanding and experience in metrology of new part cleans performance including microscopy, surface roughness, CMM critical dimension, ICPMS/VPD, LPC & bench-top particle quantification, emissivity, TXRF, SEM-EDX, laser scatter, XPS etc. Familiarity with a range of bespoke selective chemistries (acids, alkalis, detergents etc) for state-of-the-art wet and dry new part cleaning, selective etch, passivation and surface modification methods (e,g, polishing, roughening).